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Photoresists for Lift-off
by: Nagase ChemteX
![Photoresists for Lift-off](https://nagaseamerica.com/wp-content/uploads/2020/12/Nagase-Chemtex-logos-2.png)
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Nagase ChemteX offers a wide range of options of photoresist for the lift-off process to meet various manufacturing requirements.
Contact us for more information.
BLX Series Product Features
- Applicable to various upper layers without intermixing
- Customizable exposure wavelength (depending on upper layer)
- Bi-layer type (under layer)
NPR9700 Series Product Features
- Suitable anti-tapered profile with positive-tone type
- Good step coverage
- Single-layer type
- Other performance attributes include high resolution and wide margin for thickness
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