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Liquid Negative Photo Resists for Spin Coating

by: Engineered Materials Systems, Inc. (Nagase Group)

Liquid Negative Photo Resists for Spin Coating

Applications

Additional Information

Product Applications Function Key requirement Cure method Glass Transition Temperature Thickness (µ) Best Resolution (µ) Aspect ratio Recommended Starting Cure E (mJ/cm2 365nm I-Line) Color Storage Condition (°C) Shelf Life (months)
NR-2500 MEMS, Microfluids, Sensors, Etch, metallization, etc Spin coatable, 3D Structure Spin coat, high Tg, chemical resistance, high resolution UV, Thermal Bake 185 5 to 40 2.5 10:1 75 Tan 23-25 12

Services

We believe all applications are unique and customer-specific and are committed to partnering with customers to create customized solutions.

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