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Liquid Negative Photo Resists for Spin Coating

by: Engineered Materials Systems, Inc. (Nagase Group)

Liquid Negative Photo Resists for Spin Coating

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Additional Information

Product Applications Function Key requirement Cure method Glass Transition Temperature Thickness (µ) Best Resolution (µ) Aspect ratio Recommended Starting Cure E (mJ/cm2 365nm I-Line) Color Storage Condition (°C) Shelf Life (months)
NR-2500 MEMS, Microfluids, Sensors, Etch, metallization, etc Spin coatable, 3D Structure Spin coat, high Tg, chemical resistance, high resolution UV, Thermal Bake 185 5 to 40 2.5 10:1 75 Tan 23-25 12


We believe all applications are unique and customer-specific and are committed to partnering with customers to create customized solutions.

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