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Liquid Negative Photo Resists for Spin Coating
(click to enlarge)
Applications
- Microfluidics
- Sensors
- Plating
- Metallization
- MEMS
Additional Information
| Product | Applications | Function | Key requirement | Cure method | Glass Transition Temperature | Thickness (µ) | Best Resolution (µ) | Aspect ratio | Recommended Starting Cure E (mJ/cm2 365nm I-Line) | Color | Storage Condition (°C) | Shelf Life (months) |
|---|---|---|---|---|---|---|---|---|---|---|---|---|
| NR-2500 | MEMS, Microfluids, Sensors, Etch, metallization, etc | Spin coatable, 3D Structure | Spin coat, high Tg, chemical resistance, high resolution | UV, Thermal Bake | 185 | 5 to 40 | 2.5 | 10:1 | 75 | Tan | 23-25 | 12 |
